Welcome to Raith, a leading instrument manufacturer.
Raith Nanofabrication System Technologies, known for professional Electron and Ion Beam Lithography, offer unique advantages for reverse engineering of semiconductor devices.
In fact it is the inverse process of lithography that builds up a devices layer by layer. The delayering of semiconductor devices for IP analysis and layout and logic reconstruction starts with customers proprietary delayering processes. Then it becomes essential to acquire a large area image of the layer of interest, consisting of thousands of high resolution images arranged in a mosaic.
Large area imaging benefits from the stability of a lithography system architecture, the capability of precise image calibrations and the accuracy of the employed Laser Interferometer controlled Stage (LIS). Raith systems – here the CHIPSCANNER – are in use since more than 20 years at various world class facilities to acquire the highest quality image raw data with minimal distortions and image overlap to reduce erroneous computation, especially tricky when smallest feature size are seen or when pattern are highly repetitive.