Plasma, Ion and Electron (PIE) Technology Company
PIE Scientific specializes in developing advanced plasma systems for IC deprocessing and delayering in failure analysis, SEM/TEM sample and vacuum chamber cleaning. Tergeo series tabletop plasma system is designed for plasma etching and removal of the passivation layers (organic layers, nitride, and oxide) in delayering/deprocessing steps during the circuit or chip failure analysis. Tergeo-EM system can also be used to clean TEM and SEM sample and specimen holder. Unique direct + remote dual plasma source design can handle all kinds of TEM and SEM samples, including the fragile ultra-thin holey carbon grid and graphene grid.
EM-KLEEN and SEMI-KLEEN plasma source are the most advanced in-situ plasma cleaners for hydrocarbon and fluorocarbon contamination removal inside SEM, FIB, XPS and other high vacuum analytical systems. It can reduce carbon deposition caused by higher energy particles such as electron, ion, and x-ray. Improve the image quality and achieve more accurate surface analysis results; reduce the pumping-down time and improve the ultimate pressure.
We also provide TEM specimen holder vacuum storage system to keep TEM holders dry and clean.
Brands: Tergeo tabletop plasma system.
EM-KLEEN remote plasma source.
SEMI-KLEEN remote plasma source.